Movable body apparatus, pattern forming apparatus and pattern forming method, device manufacturing method, manufacturing method of movable body apparatus, and movable body drive method

ABSTRACT

A substrate stage and an empty-weight canceling mechanism that supports an empty weight of the substrate stage are made up of separate bodies. Accordingly, the size and weight of the substrate stage (a structure including the substrate stage) can be reduced, compared with the case where the substrate stage and the empty-weight canceling mechanism are integrally configured. Further, due to movement of an X coarse movement stage and a Y coarse movement stage by an X drive mechanism and a Y drive mechanism, the substrate stage is driven in an XY plane and also the empty-weight canceling mechanism that supports the empty weight of the substrate stage is driven. With this operation, the substrate stage can be driven without difficulty even when the substrate stage and the empty-weight canceling mechanism are configured of separate bodies.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of International ApplicationPCT/JP2008/000437, with an international filing date of Mar. 4, 2008,the disclosure of which is hereby incorporated herein by reference inits entirety, which was not published in English.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to movable body apparatus, pattern formingapparatus and pattern forming methods, device manufacturing methods,manufacturing methods of movable body apparatus and movable body drivemethods, and more particularly to a movable body apparatus equipped witha movable body that can move, a pattern forming apparatus to form apattern on an object and a pattern forming method using the patternforming apparatus, a device manufacturing method using the patternforming method, a method of manufacturing the movable body apparatus,and a movable body drive method to drive the movable body.

2. Description of the Background Art

Conventionally, in a process or the like of manufacturing glasssubstrates such as liquid crystal displays (flat-panel displays), aprocessing apparatus, e.g. an exposure apparatus or the like is used.

In this type of exposure apparatus, a stage device, which is equippedwith a stage that two-dimensionally moves while holding a substrateserving as an object to be exposed, and a drive mechanism that drivesthe stage, is used (e.g. refer to Kokai (Japanese Patent UnexaminedApplication Publication) No. 2006-203113).

However, in the case of this type of stage device, as the substrategrows in size, the entire stage that holds the substrate also grows insize accordingly. There is a risk that such increase in size of thesubstrate makes a stroke of the stage longer, which causes the entireapparatus to grow in size and weight.

Furthermore, when the stage grows in size and weight in the stagedevice, a drive force required to drive the stage also increases.Accordingly, the drive mechanism to drive the stage grows in size andalso heat generated from the drive mechanism increases, and therefore,there is a risk that the heat affects the substrate and the peripherythereof, which lowers the exposure accuracy.

SUMMARY OF THE INVENTION

The present invention has been made in consideration of the situationdescribed above, and according to a first aspect of the presentinvention, there is provided a first movable body apparatus, comprising:a movable body that can move; a support device that supports an emptyweight of the movable body, and can move; and a drive device that drivesthe movable body and also drives the support device according tomovement of the movable body.

With this apparatus, since the movable body and the support device thatsupports the empty weight of the movable body are made up of separatebodies, the size and weight of the movable body (a structure includingthe movable body) can be decreased compared with the case where themovable body and the support device are integrally configured. Further,since the support device is moved by the drive device according tomovement of the movable body, the movable body can be moved withoutdifficulty even when the movable body and the support device are made upof separate bodies.

According to a second aspect of the present invention, there is provideda second movable body apparatus, comprising: a movable body that canmove; a support device that supports an empty weight of the movablebody, and can move; and a drive device that drives the movable body bymovement of the support device and relative movement of the movable bodyand the support device.

With this apparatus, since the movable body and the support device thatsupports the empty weight of the movable body are configured of separatebodies, the size and weight of the movable body (a structure includingthe movable body) can be decreased compared with the case where themovable body and the support device are integrally configured. Further,since the drive device moves the movable body by movement of the supportdevice and relative movement of the movable body and the support device,a drive force by the drive device that is made to act directly on themovable body can be reduced. Accordingly, the size of the drive deviceto be placed in the vicinity of the movable body can be decreased, andas a consequence, it becomes possible to reduce the influence of theheat generated from the drive device on the periphery of the movablebody.

According to a third aspect of the present invention, there is provideda third movable body apparatus, comprising: a base having a guidingsurface; a movable body that can move relative to the base; and asupport device that supports an empty weight of the movable body and canmove on the guiding surface according to movement of the movable body,wherein the movable body is supported by the support device so that themovable body can overhang the guiding surface.

According to a fourth aspect of the present invention, there is provideda pattern forming apparatus that forms a pattern on an object, theapparatus comprising: any one of the first to third movable bodyapparatus of the present invention, in which the object is held on themovable body; and a patterning device that forms the pattern on theobject.

With this apparatus, since the pattern forming apparatus is equippedwith any one of the first to third movable body apparatus, positioncontrollability of the object is improved according to the downsizing ofthe movable body, which makes it possible to perform high-precisionpattern formation. Further, by the downsizing of the entire movable bodyapparatus, the downsizing of the pattern forming apparatus can also beenhanced.

According to a fifth aspect of the present invention, there is provideda first pattern forming method, comprising: forming a pattern on anobject using the pattern forming apparatus of the present invention.With this method, it becomes possible to perform the pattern formationon the object with high precision.

According to a sixth aspect of the present invention, there is provideda device manufacturing method using the first pattern forming method ofthe present invention.

According to a seventh aspect of the present invention, there isprovided a manufacturing method of a movable body apparatus, comprising:providing a base having a guiding surface; providing a movable body thatcan move relative to the base; and providing a support device thatsupports an empty weight of the movable body, can move on the guidingsurface according to movement of the movable body, and supports themovable body so that the movable body can overhang the guiding surface.

According to an eighth aspect of the present invention, there isprovided a first movable body drive method, comprising: supporting anempty weight of a movable body by a support device that can move; anddriving the movable body and also driving the support device accordingto movement of the movable body.

According to a ninth aspect of the present invention, there is provideda second movable body drive method, comprising: supporting an emptyweight of a movable body by a support device that can move; and drivingthe movable body by movement of the support device and relative movementof the movable body and the support device.

According to a tenth aspect of the present invention, there is provideda third movable body drive method, comprising: supporting an emptyweight of a movable body by a support device that can move; and movingthe support device on a guiding surface of a base, wherein the movablebody is supported by the support device so that the movable body canoverhang the guiding surface.

According to an eleventh aspect of the present invention, there isprovided a second pattern forming method of forming a pattern on anobject, the method comprising: driving a movable body that holds theobject, by using any one of the first to third movable body drivemethods of the present invention.

According to a twelfth aspect of the present invention, there isprovided a device manufacturing method using the second pattern formingmethod of the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS

In the accompanying drawings;

FIG. 1 is a view schematically showing a configuration of an exposureapparatus related to an embodiment;

FIG. 2 is an exploded perspective view showing a substrate stage thatconstitutes a part of a stage device in FIG. 1, with partial omission;

FIG. 3 is a longitudinal sectional view showing the stage device in FIG.1;

FIG. 4A is a longitudinal sectional view showing an empty-weightcanceling mechanism in FIG. 1, and

FIG. 4B is a perspective view showing the empty-weight cancelingmechanism with partial fracture;

FIG. 5A is a perspective view showing an inclination permissive sectionin FIG. 3, and

FIG. 5B is a perspective view showing a state where the inclinationpermissive section and a triangular-pyramid-shaped member are combined;

FIGS. 6A and 6B are views used to explain a state where the substratetable is supported by the empty-weight canceling mechanism while a partof the substrate table protrudes outside from a stage base;

FIGS. 7A to 7C are views showing modified examples of the empty-weightcanceling mechanism;

FIG. 8 is a view used to explain a placement of linear motors related toa modified example;

FIGS. 9A and 9B are views used to explain a placement and aconfiguration of a stage coupling mechanism;

FIGS. 10A and 10D are views used to explain an action of the stagecoupling mechanism; and

FIG. 11 is a view showing a modified example of a restraining method ofthe empty-weight canceling mechanism.

DESCRIPTION OF THE EMBODIMENTS

An embodiment of the present invention is described below, withreference to FIGS. 1 to 5B. FIG. 1 shows a schematic configuration of anexposure apparatus 10 related to the embodiment. Exposure apparatus 10is a projection exposure apparatus by a step-and-scan method, that is, aso-called scanning stepper.

As shown in FIG. 1, exposure apparatus 10 includes an illuminationsystem IOP, a reticle stage RST that holds a reticle R, a projectionoptical system PL, a stage device 11 that holds a substrate P so thatsubstrate P is movable along an XY plane, a body BD on which reticlestage RST, projection optical system PL, stage device 11 and the likeare mounted, and their control system, and the like.

Illumination system IOP is configured similar to the illumination systemthat is disclosed in, for example, Kokai (Japanese Patent UnexaminedApplication Publication) No. 2001-313250 (the corresponding U.S. PatentApplication Publication No. 2003/0025890), Kokai (Japanese PatentUnexamined Application Publication) No. 2002-006110 (the correspondingU.S. Patent Application Publication No. 2001/0033490), or the like. Morespecifically, illumination system IOP emits a coherent illuminationlight for exposure (illumination light) IL such as a laser beam towardreticle R. The wavelength of illumination light IL is, for example, 193nm (ArF excimer laser beam).

Body BD includes a substrate stage frame 35 that is supported at aplurality of points (three or four points) by a plurality of (e.g. threeor four) vibration isolating mechanisms 37 installed on a floor surfaceF (however, the vibration isolating mechanism in the depth of the pagesurface is not shown), and a barrel platform 31 that is horizontallysupported via a plurality of (e.g. three or four) support members 33 onsubstrate stage frame 35 (however, support member 33 in the depth of thepage surface is not shown). On the upper surface of substrate stageframe 35, a stage base 12 is installed.

On reticle stage RST, reticle R having a pattern surface (lower surfacein FIG. 1) on which a circuit pattern and the like are formed is fixedby, for example, vacuum suction. Reticle stage RST is supported in anoncontact manner via an air pad (not shown) on protruding sections 31 aand 31 b that are integrally arranged on the upper surface of barrelplatform 31 with a Y-axis direction serving as their longitudinaldirections. Reticle stage RST is drivable in a predetermined scanningdirection (which is to be the Y-axis direction orthogonal to the pagesurface of FIG. 1) at a designated scanning speed, and also is finelydrivable in the XY plane, with a reticle stage drive system (not shown)including, for example, a linear motor or the like. Incidentally, it isalso possible that barrel platform 31 and protruding sections 31 a and31 b are constituted by different members, and a vibration isolatingmechanism similar to vibration isolating mechanism 37 is arrangedbetween barrel platform 31 and protruding sections 31 a and 31 b,respectively.

The position (including rotation about a Z-axis) of reticle stage RST inthe XY plane is constantly detected at a resolution of, for example,around 0.5 to 1 nm with a reticle laser interferometer (hereinafter,referred to as a “reticle interferometer”) 41, via a reflection surface(not shown) fixed (or formed) on the reticle stage. The measurementvalues of reticle interferometer 41 are sent to a main controller (notshown), and the main controller controls the position (and the speed) ofreticle stage RST in the X-axis direction, the Y-axis direction, and aθz direction (a rotational direction about the Z-axis) via the reticlestage drive system, based on the measurement values of reticleinterferometer 41.

Projection optical system PL is configured of a plurality of projectionoptical units that project a plurality of projected images, and issupported by barrel platform 31 below reticle stage RST, with the Z-axisdirection serving as a direction of its optical axis. As projectionoptical system PL, for example, a dioptric system that is both-sidetelecentric and has a predetermined projection magnification (e.g.reduced magnification (e.g. one-quarter, one-fifth), equalmagnification, or magnification). Therefore, when an illumination areaon reticle R is illuminated with illumination light IL from illuminationsystem IOP, illumination light IL having passed through reticle R whosepattern surface is placed substantially coincident with the first plane(object plane) of projection optical system PL forms a projected image(a partial upright image or a partial inverted image) of a circuitpattern of reticle R within the illumination area, on an irradiationarea (exposure area) of illumination light IL that is conjugate to theillumination area, on substrate P which is placed on the second plane(image plane) side of projection optical system FL and whose surface iscoated with a resist (photosensitive agent); via projection opticalsystem PL. Then, by moving reticle R relative to the illumination area(illumination light IL) in the scanning direction (Y-axis direction) andalso moving substrate P relative to the exposure area (illuminationlight IL) in the scanning direction (Y-axis direction) by synchronousdrive of reticle stage RST and substrate stage PST, scanning exposure ofone shot area (divided area) on substrate P is performed, and a patternof reticle R is transferred to the shot area. More specifically, in theembodiment, a pattern is generated on substrate P by illumination systemIOP, reticle R and projection optical system PL, and the pattern isformed on substrate P by exposure of a photosensitive layer (resistlayer) on the substrate with illumination light IL.

Stage device 11 is placed on substrate stage frame 35, and includessubstrate stage PST that moves in the XY plane while holding substrateP, and an empty-weight canceling mechanism (which is also referred to asa “central pillar”) 27 that supports the empty weight of a part ofsubstrate stage PST in a noncontact manner above stage base 12 mountedon substrate stage frame 35

Substrate stage PST includes an X coarse movement stage 23X that isplaced above stage base 12 and driven along the X-axis, a Y coarsemovement stage 23Y that is placed above X coarse movement stage 23X anddriven along the Y-axis relative to X coarse movement stage 23X, and afine movement stage 21 that is placed on the +Z side (above) Y coarsemovement stage 23Y and has a substrate table 22A that holds substrate Pin a part thereof.

The respective sections constituting substrate stage PST arespecifically described below. FIG. 2 shows a perspective view ofsubstrate stage PST, from which substrate table 22A and empty-weightcanceling mechanism 27 are removed and which is partially exploded.

As shown in FIG. 2, X coarse movement stage 23X is composed of aplate-like member having a rectangular shape in a planar view (viewedfrom the Z-axis direction), and has a through-hole 23Xa having acircular shape in a planar view (viewed from the Z-axis direction)formed in its center portion. At four corner portions of the lowersurface of X coarse movement stage 23X, X sliders 65 are respectivelyarranged (however, X slider 65 arranged on the corner portion in thedepth of the page surface is not shown). Of these X sliders, two Xsliders 65 on the −Y side are in a state of engaging with an X guide61X₁ whose longitudinal direction is in the X-axis direction and two Xsliders 65 on the +Y side are in a state of engaging with an X guide61X₂ whose longitudinal direction is in the X-axis direction that isplaced at a position a predetermined distance spaced apart on the +Yside from X guide 61X₁. X slider 65 includes a rolling guide, in which aplurality of balls roll and circulate, inside thereof, and the rollingguide is formed on the +Y side surface and the −Y side surface of Xguide 61X₁ (or 61X₂). Accordingly, by a drive force in the X-axisdirection by an X drive mechanism 97X (refer to FIG. 1) including a ballscrew acting on X coarse movement stage 23X, X coarse movement stage 23Xis driven along X guides 61X₁ and 61X₂ (along the X-axis direction).incidentally, each X slider 65 can be an air guide that blows out a gasto the +Y side surface and the −Y side surface of X guide 61X₁ (or61X₂). In this case, a predetermined clearance is formed between each Xslider 65, and the +Y side surface and the −Y side surface of X guide61X₁ (or 61X₂).

One X guide, X guide 61X₁ is supported from the lower side by aplate-shaped member 69 ₁ whose longitudinal direction is in the X-axisdirection, and the other X guide, X guide 61X₂ is supported from thelower side by a plate-shaped member 69 ₂ whose longitudinal direction isin the X-axis direction. And, each of plate-shaped members 69 ₁ and 69 ₂is supported by a plurality of support legs 67 above floor surface F(refer to FIG. 1).

As shown in FIG. 2, Y coarse movement stage 23Y placed above X coarsemovement stage 23X is composed of a plate-like member having arectangular shape in a planar view (viewed from the Z-axis direction)that has an area size smaller than X coarse movement stage 23X, and hasa through-hole 23Ya formed in its center portion. At four cornerportions of the lower surface of Y coarse movement stage 23Y, Y sliders63 are respectively arranged (however, Y slider 63 arranged on thecorner portion in the depth of the page surface is not shown). Of theseY sliders, two Y sliders 63 on the +X side are in a state of engagingwith a Y guide 61Y₁ arranged near the +X side end of the upper surfaceof X coarse movement stage 23X with the Y-axis direction serving as itslongitudinal direction and two Y sliders 63 on the −X side are in astate of engaging with a Y guide 61Y₂ arranged near the −X side end ofthe upper surface of X coarse movement stage 23X with the Y-axisdirection serving as its longitudinal direction. Y slider 63 includes arolling guide, in which a plurality of balls roll and circulate, insidethereof, and the rolling guide is formed on the +X side surface and the−X side surface of Y guide 61Y₁ (or 61Y₂). Accordingly, by a drive forcein the Y-axis direction by a Y drive mechanism 97Y (refer to FIG. 1)including a ball screw acting on Y coarse movement stage 23Y, Y coarsemovement stage 23Y is driven along Y guides 61Y₁ and 61Y₂ (along theY-axis direction). Incidentally, each Y slider 63 can be an air guidethat blows out a gas to the +X side surface and the −X side surface of Yguide 61Y₁ (or 61Y₂). In this case, a predetermined clearance is formedbetween each Y slider 63, and the +X side surface and the −X sidesurface of Y guide 61Y₁ (or 61Y₂).

On the upper surface of Y coarse movement stage 23Y, seven stators intotal (X stators 53X₁ and 53X₂, Y stators 53Y, and 53Y₂, and Z stators53Z₁, 53A₂ and 53Z₃) are arranged.

Of these stators, X stators 53X₁ and 53X₂ are respectively supportednear the +X side end of the upper surface of Y coarse movement stage23Y, by support member 57. An armature unit having a plurality ofarmature coils is arranged inside X stators 53X₁ and 53X₂.

Y stators 53Y₁ and 53Y₂ are respectively supported near the −Y side endof the upper surface of Y coarse movement stage 23Y, by support member57. An armature unit having a plurality of armature coils is arrangedinside Y stators 53Y₁ and 53Y₂, similarly to X stators 53X₁ and 53X₂described above.

Z stators 53Z₁ to 53Z₃ are placed at three points that are notpositioned in a straight line on the upper surface of Y coarse movementstage 23Y. Armature coils axe arranged inside Z stators 53Z₁ to 53Z₃.

Referring back to FIG. 1, fine movement stage 21 described earlierincludes substrate table 22A and a stage main section 22B that supportssubstrate table 22A from the lower side.

Substrate table 22A is composed of a rectangular-shaped member, and onthe upper surface of substrate table 22A, a vacuum suction mechanism (ora substrate holder) used to hold substrate P by suction is arrangedalthough not shown in the drawings.

As shown in FIG. 2, stage main section 22B is composed of arectangular-shaped plate-like member, and a movable mirror (bar mirror)17X is arranged on the side surface on the −X side of stage main section22B via an attachment member 24X, and a movable mirror (bar mirror) 17Yis arranged on the side surface on the +Y side of main section 22B viaan attachment member 24Y. The −X side surface of movable mirror 17X andthe +Y side surface of movable mirror 17Y are mirror-polished and serveas reflection surfaces. Positional information of fine movement stage 21in the XY plane is constantly detected at a resolution of, for example,around 0.5 to 1 nm with a substrate laser interferometer (hereinafter,referred to as a “substrate interferometer”) 19 (refer to FIG. 1) thatirradiates movable mirrors 17X and 17Y with measurement beams. In thiscase, although an X laser interferometer and a Y laser interferometerare actually arranged corresponding to X movable mirror 17X and Ymovable mirror 17Y respectively, they are representatively shown assubstrate interferometer 19 in FIG. 1.

X movers 51X₁ and 51X₂ each having a U-like sectional shape are fixed tothe side surface on the +X side of stage main section 22B. A magneticpole unit, which includes a plurality of permanent magnets (or a singlepermanent magnet) disposed along the X-axis direction, is respectivelyarranged on a pair of facing surfaces of each of X movers 51X₁ and 51X₂,though not shown in the drawing. X movers 51X₁ and 51X₂ engage with Xstators 53X₁ and 53X₂, respectively, in a state where stage main section22B and Y coarse movement stage 23Y are interlocked (the state shown inFIG. 1). Therefore, due to electromagnetic interaction between theelectric current supplied to the armature units (armature coils) which Xstators 53X₁ and 53X₂ have and the magnetic field formed in the internalspace of the magnetic pole units which X movers 51X₁ and 51X₂ have, itis possible to make the drive force in the X-axis direction act on Xmovers 51X₁ and 51X₂. More specifically, in the embodiment, an X-axislinear motor 55X₁ is constituted by X mover 51X₁ and X stator 53X₁, andan X-axis linear motor 55X₂ is constituted by X mover 51X₂ and X stator53X₂.

Further, Y movers 51Y₁ and 51Y₂ are fixed to the side surface on the −Yside of stage main section 22B. A magnetic pole unit, which includes aplurality of permanent magnets (or a single permanent magnet) disposedalong the Y-axis direction, is respectively arranged on a pair of facingsurfaces of each of Y movers 51Y₁ and 51Y₂. Y movers 51Y₁ and 51Y₂engage with Y stators 53Y₁ and 53Y₂, respectively, in a state wherestage main section 22B and Y coarse movement stage 23Y are interlocked(the state shown in FIG. 1). Therefore, due to electromagneticinteraction between the electric current supplied to the armature units(armature coils) of Y stators 53Y₁ and 53Y₂ and the magnetic fieldformed in the internal space of the magnetic pole units of Y movers 51Y₁and 51Y₂, it is possible to make the drive force in the Y-axis directionact on Y movers 51Y₁ and 51Y₂. More specifically, in the embodiment, aY-axis linear motor 55Y₁ is constituted by Y mover 51Y₁ and Y stator53Y₁, and a Y-axis linear motor 55Y₂ is constituted by Y mover 51Y₂ andY stator 53Y₂.

Further, on the lower surface (the surface on the −Z side) of stage mainsection 22B, Z movers 51Z₁, 51Z₂ and 51Z₃ each having an XZ sectionalsurface of a roughly inversed U-like shape are arranged. Permanentmagnets are arranged on a pair of facing surfaces of each of Z movers51Z₁ to 51Z₃. Z movers 51Z₁ to 51Z₃ engage with Z stators 53Z₁ to 53Z₃,respectively, in a state where fine movement stage 21 and Y coarsemovement stage 23Y are interlocked (the state shown in FIG. 1).Therefore, due to electromagnetic interaction between the electriccurrent supplied to the armature coils of Z stators 53Z₁ to 53Z₃ and themagnetic field formed in the internal space of Z movers 51Z₁ to 51Z₃, itis possible to make the drive force in the Z-axis direction act on Zmovers 51Z₁ to 51Z₃. More specifically, in the embodiment, a Z-axislinear motor 55Z₁ is constituted by Z mover 51Z₁ and Z stator 53Z₁, anda Z-axis linear motor 55Z₂ is constituted by Z mover 51Z₂ and Z stator53Z₂, and further a Z-axis linear motor 55Z₃ is constituted by Z mover51Z₃ and Z stator 53Z₃.

As is described above, since X-axis linear motors 55X₁ and 55X₂, Y-axislinear motors 55Y₁ and 55Y₂, and Z-axis linear motors 55Z₁ to 55Z₃ arearranged between fine movement stage 21 (stage main section 22B) and Ycoarse movement stage 23Y, fine movement stage 21 (stage main section22B) can be finely drive in the X-axis, Y-axis and Z-axis directions,relative to Y coarse movement stage 23Y. Further, by making therespective drive forces of X-axis linear motors 55X₁ and 55X₂ (or therespective drive forces of Y-axis linear motors 55Y₁ and 55Y₂) bedifferent, fine movement stage 21 (stage main section 22B) can be finelydriven in a rotational direction about the Z-axis (θz direction),relative to Y coarse movement stage 23Y, and by making the respectivedrive forces of Z-axis linear motors 55Z₁ to 55Z₃ be different, finemovement stage 21 (stage main section 22B) can be finely driven in arotational direction about the X-axis (θx direction) and a rotationaldirection about the Y-axis (θy direction), relative to Y coarse movementstage 23Y. Incidentally, although FIG. 2 shows the X-axis and Y-axislinear motors arranged on the side surfaces on the +X side and the −Yside of fine movement stage 21, the linear motors can be placeddispersedly on the three sides or the four sides. Further, at least apart of the magnetic pole units and the armature units can have theinversed positional relations with the positional relations describedabove.

Next, empty-weight canceling mechanism 27 is described with reference toFIGS. 3 to 5B.

FIG. 3 shows a state where the X-axis linear motors, the Y-axis linearmotors and the Z-axis linear motors are removed from stage device 11, ina sectional view.

As shown in FIG. 3, fine movement stage 21 includes substrate table 22A,stage main section 22B and an inclination permissive section 76 arrangedbelow stage main section 22B. Further, empty-weight cancelling mechanism27 is placed in a state of penetrating through-hole 23Xa formed in Xcoarse movement stage 23X and through-hole 23Ya formed in Y coarsemovement stage 23Y described earlier. Empty-weight cancelling mechanism27 includes: a main section 74 which has a housing 70, an air spring 71arranged inside housing 70 and a slide section 73 that is verticallymovable in the Z-axis direction; and three base pads 75 arranged at thelower end of main section 74.

As can be seen from FIGS. 4A and 4B that show empty-weight cancellingmechanism 27 with partial fracture, housing 70 has a space 77 insiderand a plurality of (four in FIGS. 4A and 4B) air pads 78 are placed inspace 77.

Further, one ends of four flexures 89 are respectively fixed to theouter periphery of housing 70 with a predetermined spacing. The otherends of flexures 89 are connected respectively to four support members90 arranged on the lower surface of Y coarse movement stage 23Y, asshown in FIG. 3. More specifically, housing 70 is connected to Y coarsemovement stage 23Y via flexures 89, and therefore housing 70 is in astate of being restrained in the X-axis and Y-axis directions and notbeing restrained in the Z-axis, θx, θy and θz directions due to theaction of rigidity and hinge joint of members of flexures 89. As shownin FIG. 3 flexures 89 are connected to housing 70 at the height position(Z-position) that is substantially the same as the height position ofthe center of gravity G of empty-weight cancelling mechanism 27.

Air spring 71 is arranged at the lowermost section in space 77 insidehousing 70. A gas is supplied from a gas supplying device (not shown) toair spring 71, and accordingly, the inside of air spring 71 is set to bea positive pressure space in which the atmospheric pressure is higherthan in the outside.

As shown in FIG. 4A, slide section 73 has: a slide section main body 79having a rectangular parallelepiped shape; and three pad members 81 eachhaving a roughly rhombus shape in a planar view (viewed from the +Zdirection) (refer to FIG. 4B) that are fixed to the upper end of slidesection main body 79 via ball-and-socket joints (ball joints) 80,respectively. Each pad member 81 can change its attitude in aninclination direction with respect to the XY plane by ball joint 80. Agas can be blown out from the upper surfaces (+Z side surfaces) of padmembers 81 to the lower surface of inclination permissive section 76shown in FIG. 3, and because of the static pressure of the gas betweenthe lower surface of inclination permissive section 76 and therespective pad members 81, a predetermined clearance is formed betweenthe upper surface of pad member 81 and the lower surface of inclinationpermissive section 76.

The outer peripheral surface of slide section main body 79 faces each ofa plurality of air pads 78 arranged inside housing 70 described earlier.Therefore, a predetermined clearance is formed between the outerperipheral surface of slide section main body 79 and the respectivebearing surfaces of air pads 78. Accordingly, in the embodiment, it ispossible to perform slide drive of slide section 73 in the Z-axisdirection according to the pressure in air spring 71.

As shown in FIGS. 4A and 4B, each base pad 75 includes: a base pad mainbody 83; and ball-and-socket joint (ball joint) 82 that links base padmain body 83 with the lower surface of housing 70. Each base pad mainbody 83 can form a predetermined clearance between the base pad mainbody 83 and the upper surface of stage base 12 by blowing out a gas tothe upper surface of stage base 12. More specifically, each base padmain body 83 functions as a hydrostatic gas bearing that forms apredetermined clearance by the static pressure of the gas between thelower surface of the base pad main body 83 and the upper surface ofstage base 12. Further, each base pad main body 83 can change itsattitude in the inclination direction with respect to the XY plane byball joint 82.

Referring back to FIG. 3, inclination permissive section 76 is arrangedbetween a triangular-pyramid-shaped member 88 arranged on the lowersurface of stage main section 22B of fine movement stage 21 and slidesection 73 (to be more specific, three pad members 81 shown in FIG. 4A).Inclination permissive section 76 is supported in a noncontact manner bythree pad members 81 described previously. More specifically, stage mainsection 22B is supported by a plurality of planar bearings. In otherwords, the position of inclination permissive section 76 relative tomain section 74 in the XY plane can be changed.

As shown in a perspective view of FIG. 5A, inclination permissivesection 76 includes: a foundation section 84; three support sections 85Ato 85C arranged on the upper surface of foundation section 84; hinges(or ball joints) 86A to 86C arranged at the respective support sections85A to 85C; and pad sections 87A to 87C fixed to hinges (or ball joints)86A to 86C respectively.

As shown in FIG. 5B, each of pad sections 87A to 87C faces each ofsurfaces 88 a to 88 c of triangular-pyramid-shaped member 88 and canblow out a gas to each of surfaces 88 a to 88 c. Therefore, because ofthe static pressure of the gas blown out from the respective padsections 87A to 87C, a predetermined clearance is formed between each ofpad sections 87A to 87C and each of the facing surfaces. Further, sincepad sections 87A to 87C are attached to support sections 85A to 85C viahinges (or ball joints) 86A to 86C, triangular-pyramid-shaped member 88is supported in a state where movement in the θx, θy and θz directionsis permitted by inclination permissive section 76.

With empty-weight cancelling mechanism 27 having the above-describedconfiguration, the empty weight of fine movement stage 21 is supportedby the positive pressure inside air spring 71, and a predeterminedclearance is constantly formed between empty-weight cancelling mechanism27 and stage base 12 by the action of three base pads 75. Further,inclination permissive section 76, which is noncontact with bothtriangular-pyramid-shaped member 88 arranged on the lower surface offine movement stage 21 and empty-weight cancelling mechanism 27, ispresent between them, and therefore, the empty weight of fine movementstage 21 can be supported by empty-weight cancelling mechanism 27 in astate where movement (movement by a minutely small amount) of finemovement stage 21 in the inclination direction and in the XY plane ispermitted.

Further, the configuration is employed in which, of vibrationpropagating to empty-weight cancelling mechanism 27, vibration indirections other than the X-axis direction, the Y-axis direction and theθz direction is not transmitted to fine movement stage 21, sinceempty-weight cancelling mechanism 27 is noncontact with fine movementstage 21. Furthermore, as is described earlier, since empty-weightcancelling mechanism 27 is coupled with Y coarse movement stage 23Y viaflexures 89 of which the restraint force in directions other then X-axisand Y-axis directions is substantially zero (refer to FIGS. 3 and 4A), avibration component in the Z-axis direction, the θx direction, the θydirection and the θz direction, which is a part of vibration from Ycoarse movement stage 23Y, is hart to be transmitted to empty-weightcancelling mechanism 27. As a consequence, vibration except forvibration from stage base 12 is hard to be transmitted to fine movementstage 21.

Referring back to FIGS. 4A and 4B, three arm sections 91 each having aroughly L-shaped sectional surface are fixed to housing 70 (however, thearm section located on the front side of the page surface is not shown).A probe section 92 is arranged at one end of each of arm sections 91. Asshown in FIG. 3, target sections 93 are arranged above probe sections92. Capacitance sensors (Z sensors) 94, which can measure a distancebetween probe section 92 and target section 93, are configured includingprobe sections 92 and target sections 93. In this case, probe sections92 constituting Z sensor 94 are arranged on a part of empty-weightcancelling mechanism 27, and the constant attitude of empty-weightcancelling mechanism 27 is maintained at all times relative to the uppersurface of stage base 12, and therefore, by using the measurement resultobtained by Z sensors 94, the Z-position of fine movement stage 21 canbe computed (converted) with the upper surface of stage base 12 servingas a reference. Further, because three Z sensors 94 are arranged as isdescribed above, the attitude in directions inclined with respect to theXY plane can also be computed with the upper surface of stage base 12serving as a reference, by using the measurement result of three Zsensors 94. Incidentally, in the embodiment, not three, but four armsections 91 each having a roughly L-shaped section surface can bearranged at housing 70. And, the positional relation between probesections 92 and target sections 93 can be inversed. Further, the numberof Z sensors 94 is not limited to three but can be four, and themeasurement method of Z sensor 94 is not limited to the capacitancesensor but can be a laser displacement meter by a CCD method or thelike. Incidentally, the relative positional relation betweenempty-weight cancelling mechanism 27 and fine movement stage 21 can beobtained using Z sensors 94.

Referring back to FIG. 1, in exposure apparatus 10 having theconfiguration as described above, reticle R is loaded onto reticle stageRST by a reticle loader (not shown) and substrate P is loaded onto finemovement stage 21 by a substrate loader (not shown). Subsequently, themain controller executes alignment measurement using an alignmentdetection system (not shown), and after the alignment measurement iscompleted, performs an exposure operation by a step-and-scan method.Since this exposure operation is similar to the step-and-scan methodconventionally performed, the description thereof is omitted herein.

While the alignment operation and the exposure operation are performed,the main controller (not shown) performs drive control of X coarsemovement stage 23X and Y coarse movement stage 23Y via X drive mechanism97X and Y drive mechanism 97Y that include the ball screws, based on themeasurement values of interferometer 19, and also performs positioncontrol of fine movement stage 21 (substrate P) via X-axis linear motors55X₁ and 55X₂, Y-axis linear motors 55Y₁ and 55Y₂ and Z-axis linearmotors 55Z₁ to 55Z₃, based on the measurement values of interferometer19 and the measurement values of three Z sensors 94. More specifically,in the embodiment, substrate P is moved (and the position of substrate Pis set) in the XY planer by respectively moving X coarse movement stage23X, Y coarse movement stage 23Y and empty-weight cancelling mechanism27 in the XY plane with a long stroke and also by finely moving finemovement stage 21 relative to X coarse movement stage 23X, Y coarsemovement stage 23Y and empty-weight cancelling mechanism 27.

As is described in detail above, according to the embodiment,empty-weight cancelling mechanism 27 that supports the empty-weight offine movement stage 21 is configured of a separate body from finemovement stage 21, and therefore, the size and weight of fine movementstage 21 (the structure including fine movement stage 21) can bereduced, compared with the case where fine movement stage 21 andempty-weight cancelling mechanism 27 are integrally configured.Accordingly, the position controllability (including the positionsetting accuracy) of fine movement stage 21 is improved, which makes itpossible to improve the exposure accuracy of exposure apparatus 10.

Further, by movement of X coarse movement stage 23X and Y coarsemovement stage 23Y by X drive mechanism 97X and Y drive mechanism 97Y,fine movement stage 21 is driven in the XY plane and empty-weightcancelling mechanism 27 that supports the empty-weight of fine movementstage 21 is also driven, and therefore, fine movement stage 21 can bedriven without difficulty even when fine movement stage 21 andempty-weight cancelling mechanism 27 are made up of separate bodies.

Further, according to the embodiment, drive control of fine movementstage 21 is performed, by driving fine movement stage 21 andempty-weight cancelling mechanism 27 in the XY plane via X drivemechanism 97X and Y drive mechanism 97Y, and also by finely driving finemovement stage 21 and empty-weight cancelling mechanism 27, relatively,in directions of six degrees of freedom via X-axis linear motors 55X₁and 55X₂, Y-axis linear motors 55Y₁ and 55Y₂ and Z-axis linear motors55Z₁ to 55Z₃. Accordingly, the size of the drive mechanisms (55X₁ and55X₂, 55Y₁ and 55Y₂, and 55Z₁ to 55Z₃) to be arranged in the vicinity offine movement stage 21 can be reduced, and therefore, the influence onsubstrate P of heat generated by the drive mechanisms (i.e. influence onthe exposure accuracy) can be reduced. Further, because the drivemechanisms can be placed at the height that is substantially the same asthe position of center of gravity in the height direction (Z-axisdirection), drive of the center of gravity can be performed, whichallows the stable attitude to be maintained.

Furthers according to the embodiment, when fine movement stage 21 movesabove stage base 12, the empty-weight of fine movement stage 21 isconstantly supported by empty-weight cancelling mechanism 27. Morespecifically, by setting the −Z side surface of empty-weight cancellingmechanism 27 (the −Z side surfaces of base pad main bodies 83), whichfaces the +Z side surface of stage base 12, to be small, it becomespossible to decrease the area size of the +Z side surface of stage base12, which allows the size of stage device 11, and hence the size of theentire exposure apparatus 10 to be reduced, as a consequence.

For example, as shown in a simplified manner in FIG. 6A, theconfiguration is employed in which the rough center of substrate table22A (fine movement stage 21) in the XY plane is supported byempty-weight cancelling mechanism 27 and empty-weight cancellingmechanism 27 includes the position of center of gravity in the XY planeof substrate table 22A (fine movement stage 21). With thisconfiguration, the size of an area where the −Z side surface ofempty-weight cancelling mechanism 27 (the −Z side surface of base padmain body 83) is projected on the upper surface (guiding surface) ofstage base 12 is smaller than the size of an area where substrate table22A (fine movement stage 21) is projected on the upper surface (guidingsurface) of stage base 12, and the area where empty-weight cancellingmechanism 27 is projected is positioned substantially in the center ofthe area where substrate table 22A (fine movement stage 21) isprojected.

Accordingly, as shown in FIG. 6B, even it empty-weight cancellingmechanism 27 is located at the edge of the upper surface (guidingsurface) of stage base 12, substrate table 22A (fine movement stage 21)is located in a state (overhang state) of overhanging the upper surface(guiding surface) of stage base 12, in the XY plane. More specifically,substrate table 22A (fine movement stage 21) can move in a range largerthan the upper surface (guiding surface) of stage base 12 in the XYplane, and therefore, when a stage movable area, i.e. a predeterminedmovement area SMA (refer to FIG. 6A) of substrate table 22A (finemovement stage 21) is set, the area size of the upper surface (guidingsurface) of stage base 12 can be set smaller than the area size ofmovement area SMA.

Further, according to the embodiment, empty-weight cancelling mechanism27 is connected to Y coarse movement stage 23Y via flexures 89, andtherefore, the vibration in the Z-axis, θx, θy and θz directions is hardto be transmitted between empty-weight cancelling mechanism 27 and Ycoarse movement stage 23Y. Accordingly, shake (vibration in a broadsense) in the Z-axis, θx, θy and θz directions, which propagates to Ycoarse movement stage 23Y, is hard to be transmitted to empty-weightcancelling mechanism 27.

Further, according to the embodiment, fine movement stage 21 isconnected in a noncontact manner to each of the linear motors that drivefine movement stage 21 in directions of six degrees of freedom and drivemechanisms 97X and 97Y including the ball screws that drive empty-weightcancelling mechanism 27 in directions of two degrees of freedom, so asto be separated from the linear motors and drive mechanisms 97X and 97Yvibrationwise, and therefore, high-precision drive (position setting) offine movement stage 21 can be performed.

Further, according to the embodiment, stage device 11 is equipped withcapacitance sensors (Z sensors) 94 that include probe sections 92arranged on empty-weight cancelling mechanism 27 and target sections 93arranged on fine movement stage 21, and can measure a distance betweenprobe section 92 and target section 93. Accordingly, since the constantattitude of empty-weight cancelling mechanism 27 is maintained relativeto the upper surface of stage base 12, the measurement result of Zsensors 94 can be converted into the Z position of fine movement stage21, with the upper surface of stage base 12 serving as a reference. Withthis operation, it is possible to measure the attitude of fine movementstage 21 (substrate P) in the direction inclined with respect to XYplane, with the upper surface of stage base 12 serving as a reference.

Incidentally, in the embodiment above, although empty-weight cancellingmechanism 27 including air spring 71 inside is employed, this is notintended to be limiting, and for example, as shown in FIG. 7A, anempty-weight cancelling mechanism 27′ that has an elastic member 71′such as a coil spring, instead of air spring 71, can be employed.

Further, an empty-weight cancelling mechanism 27″ that has a z drivemechanism 101 as shown in FIG. 7B, instead of the air spring and theelastic member, can be employed. Z drive mechanism 101 includes: an Xslider 102X having a right-angled triangle shape when viewed from the +Yside; a Z slider 102Z having a trapezoidal shape when viewed from the +Ydirection that is mounted on the +Z side of X slider 102X; and an Xdrive section 103 that gives a drive force in the X-axis direction to Xslider 102X. And, X slider 102X is slidable in the X-axis direction witha bearing 104X, and Z slider 102Z is slidable in the Z-axis directionwith a bearing 104Z.

With Z drive mechanism 101, since X slider 102X and Z slider 102Zcontact with each other via the respective inclined surfaces, Z slider102Z can be moved in the +Z direction by moving X slider 102X in the +Xdirection using X drive section 103, by the principle of wedge, as shownin FIG. 7C.

Incidentally, in the embodiment above, the case has been described whereY coarse movement stage 23Y and empty-weight cancelling mechanism 27 arecoupled by flexures 89, as shown in FIG. 3, but this is not intended tobe limiting, and for example, both of them can be coupled using platesprings, or both of them can be coupled using wire ropes. Further, therestraint of empty-weight cancelling mechanism 27 can be performed byusing the static pressure of the air pads, the electromagnetic forcegenerated by the linear motors, the magnetic force, or the like.Incidentally, although a spherical bearing is shown in FIGS. 7A to 7C asthe means to support stage main section 22B in an inclinable manner,this spherical bearing can be used instead of inclination permissivesection 76 in FIG. 3.

Further, in the embodiment above, although X-axis linear motors 55X₁ and55X₂, Y-axis linear motors 55Y₁ and 55Y₂ and Z-axis linear motors 55Z₁to 55Z₃ are arranged in the placement as shown in FIG. 2, this it notintended to be limiting, and for example, the placement as shown in FIG.8 can be employed. More specifically, as shown in FIG. 8, it is alsopossible that X-axis linear motors 155X₁ and 155X₂ are placed on theside surface on the +Y side and the side surface on the −Y side of stagemain section 22B, Y-axis linear motors 155Y₁ and 155Y₂ are placed on theside surface on the +X side and the side surface on the −X side of stagemain section 22B. With this placement as well, the drive of finemovement stage 21 can be performed in a similar manner to the manner inthe embodiment above.

Incidentally, in the embodiment above, the configuration is employed inwhich inclination permissive section 76 has hinges (or ball joints) 86Ato 86B and three pad sections 87A to 87C, as shown in FIGS. 5A and 5B,but this is not intended to be limiting, and for example, aconfiguration, in which the hinges (or ball joints) are arranged betweenfoundation section 84 and fine movement stage 21 (stage main section22B), can also be employed.

Incidentally, one each pair of stage coupling mechanism 110X and a stagecoupling mechanism 110Y as shown in FIGS. 9A and 9B can be arranged onstage device 11.

Of these stage coupling mechanisms, stage coupling mechanism 110X canemploy a configuration that includes a first plate-like member 105 fixedto the lower surface of stage main section 22B that constitutes finemovement stage 21, a second plate-like member fixed to the upper surfaceof Y coarse movement stage 23Y, and a piston mechanism 107 fixed to the−X side surface of second plate-like member 109, as shown in FIG. 9A.Piston mechanism 107 has a cylinder 107 b, and a piston rod 107 a havinga piston (not shown) at its one end that is movable in the X-axisdirection along the inner circumferential surface of cylinder 107 b isfixed. Further, the similar configuration can be employed also for stagecoupling mechanism 110Y.

With this stage coupling mechanism (e.g. stage coupling mechanism 110X),as shown in FIG. 10A, by supplying a gas into an internal space ofcylinder 107 b to move piston rod 107 a in the −X direction via thepiston, the other end of piston rod 107 a can be made to contact withthe +X side surface of first plate-like member 105. Further, as shown inFIG. 10B, by decreasing the gas present in the internal space ofcylinder 107 b to move piston 107 a in the +X direction, piston rod 107a can be made to be away from first plate-like member 105.

With this operation, in the cases such as where exposure by astep-and-scan method is performed as in the embodiment above, whenacceleration movement of substrate P (fine movement stage 21) isperformed, the acceleration movement is performed in a state where finemovement stage 21 and Y coarse movement stage 23Y are coupled usingstage coupling mechanisms 110X and 110Y, as shown in FIG. 10A. When theacceleration movement is completed and then shifts to constant speedmovement, as shown in FIG. 10E, the coupling by stage couplingmechanisms 110X and 110Y is released to uncouple Y coarse movement stage23Y and fine movement stage 21, and the position control of finemovement stage 21 is performed with X-axis linear motors 55X₁ and 55X₂,Y-axis linear motors 55Y₁ and 55Y₂, and Z-axis linear motors 55Z₁ to55Z₃ described previously.

With this operation, it becomes unnecessary to make the respectivemotors (55X₁, 55X₂, 55Y₁ and 55Y₂), which perform the position controlof fine movement stage 21, generate the drive force used to make finemovement stage 21 follow X and Y coarse movement stages 23X and 23Y,during the acceleration (during non-exposure). Therefore, the maximumgenerating thrust force required for the respective motors (55X₁, 55X₂,55Y₁ and 55Y₂) can be small, which enhances the downsizing of themotors. Accordingly, the weight of the entire stage device 11 can bedecreased, and also the influence of heat generated by the motors on theexposure accuracy can be reduced. Further, the cost of the motors canalso be lowered.

Incidentally, in FIGS. 9A and 9B, stage coupling mechanisms 110X and110Y are both arranged, but this is not intended to be limiting, andeither one of them (e.g. only stage coupling mechanism 110Y) can bearranged.

Further, the configuration of stage coupling mechanisms 110X and 110Y isnot limited to the one described above, but for example, a configurationcan also be employed in which the stages can be coupled and uncoupled bycombination of a permanent magnet and an electromagnet, and otherconfigurations can be employed.

Incidentally, in the embodiment above, although the case has beendescribed where empty-weight cancelling mechanism 27 is connected to Ycoarse movement stage 23Y as shown in FIG. 3, this is not intended to belimiting, and as shown in FIG. 11, a configuration can also be employedin which empty-weight cancelling mechanism 27 is connected to aconnecting member 90′ arranged on the lower side of fine movement stage21 (to be more precise, of stage main section 22B). In this case,empty-weight cancelling mechanism 27 and connecting member 90′ can beconnected (restrained in the XY plane) by flexures, similarly to theembodiment above. Alternatively, empty-weight cancelling mechanism 27and connecting member 90′ can be mechanically connected by platesprings, or can be connected (restrained in the XY plane) by the staticpressure of the air pads, the electromagnetic force generated by thelinear motors, or the means to generate a force such as a magneticforce.

Incidentally, in the embodiment above, as illumination light IL, aharmonic wave, which is obtained by amplifying a single-wavelength laserbeam in the infrared or visible range emitted by a DFB semiconductorlaser or fiber laser, with a fiber amplifier doped with, for example,erbium (or both erbium and ytteribium), and by converting the wavelengthinto ultraviolet light using a nonlinear optical crystal, can also beused.

Further, in the embodiment above, as illumination light IL, an emissionline in the ultraviolet region (such as a g-line (wavelength: 436 nm),an h line (wavelength: 405 nm) or an i line (wavelength: 365 nm))generated by an extra-high pressure mercury lamp can also be used.Further, the light source is not limited to the ArF excimer laser or theextra-high pressure mercury lamp, but a light source that generates avacuum ultraviolet light such as a KrF excimer laser light with awavelength of 248 nm, an F₂ laser light with a wavelength of 157 nm, aKr₂ excimer laser light with a wavelength of 146 nm or an Ar₂ excimerlaser light with a wavelength of 126 nm can also be used. Further, asolid-state laser (output wavelength: 355 nm or 260 nm) or the like canalso be used.

Further, in the embodiment above, the case has been described where thepresent invention is applied to a scanning exposure apparatus, but thisis not intended to be limiting, and the present invention is suitablyapplied to an exposure apparatus by a step-and-repeat method (aso-called stepper), an exposure apparatus by a step-and-stitch method,an exposure apparatus by a proximity method, a mirror projection aligneror the like.

Incidentally, in the embodiment above, a transmissive type mask, whichis a transmissive mask substrate on which a predetermined lightshielding pattern (or a phase pattern or a light attenuation pattern) isformed, is used. Instead of this mask, however, as is disclosed in, forexample, U.S. Pat. No. 6,778,257, an electron mask (variable shapedmask) on which a light-transmitting pattern, a reflection pattern, or anemission pattern is formed according to electronic data of the patternto be exposed can also be used. For example, a variable shaped mask thatuses a DMD (Digital Micromirror Device) that is a type of a non-emissiontype image display device (which is also called a spatial lightmodulator) can be used.

In addition, the present invention can also be applied to an exposureapparatus such as a liquid immersion type exposure apparatus in which aspace between a projection optical system and a substrate is filled witha liquid, which is disclosed in, for example, International publicationNo. 2004/053955 (the corresponding U.S. Patent Application PublicationNo. 2005/0259234) and the like.

The use of the exposure apparatus is not limited to the exposureapparatus for liquid crystal display devices that transfers a liquidcrystal display device pattern onto a rectangular glass plate, but thepresent invention can also be widely applied, for example, to anexposure apparatus for manufacturing semiconductors, and an exposureapparatus for producing thin-film magnetic heads, micromachines, DNAchips, and the like. Further, the present invention can be applied notonly to an exposure apparatus for producing microdevices such assemiconductor devices, but can also be applied to an exposure apparatusthat transfers a circuit pattern onto a glass substrate or silicon waferto produce a reticle or a mask used in a light exposure apparatus, anEUV exposure apparatus, an X-ray exposure apparatus, an electron-beamexposure apparatus, and the like. Incidentally, a substrate that issubject to exposure is not limited to a glass plate, but for example,can be a wafer or the like.

Incidentally, the exposure apparatus that forms a pattern on a substratehas been described above, but the method to form the pattern on thesubstrate with a scanning operation can be achieved not only by theexposure apparatus, but also a device manufacturing apparatus equippedwith a functional liquid imparting device with an inkjet method similarto the inkjet head group, which is disclosed in, for example, Kokai(Japanese Patent Unexamined Application Publication) No. 2004-130312 andthe like.

The inkjet head group disclosed in the above publication has a pluralityof inkjet heads that discharge a predetermined functional liquid (suchas a metal-containing liquid or a photosensitive material) from a nozzle(discharging outlet) and impart the liquid to a substrate (e.g. PET,glass, silicon, paper or the like). The functional liquid impartingdevice like this inkjet head group can be prepared and used forgenerating the pattern. In the device manufacturing apparatus equippedwith this functional liquid imparting device, it is possible that thefunctional liquid imparting device is scanned in a scanning directionwhile a substrate is fixed, or it is also possible that the substrateand the functional liquid imparting device are scanned in the directionsopposite to each other.

For example, in the case of manufacturing a liquid crystal displaydevice, the liquid crystal display device is manufactured through thefollowing steps: a pattern forming step, which includes the respectiveprocessing processes such as a so-called optical lithography processwhere a pattern is formed on a photosensitive substrate (such as a glasssubstrate coated with a resist) using the various types of exposureapparatus described above (a process where a predetermined patternincluding many electrodes and the like is formed on the photosensitivesubstrate), a development process of the exposed substrate, an etchingprocess, and a resist removing process; a color filter forming step offorming a color filter in which many sets of three dots corresponding toR (Red), G (Green) and B (blue) are disposed in a matrix shape, or aplurality of sets of three stripes of R, G and B are disposed inhorizontal scanning line directions; a cell assembling step where aliquid crystal panel (liquid crystal cell) is assembled using thesubstrate having the predetermined pattern obtained in the patternforming step, the color filter obtained in the color filter formingstep, and the like; a module assembling step where a liquid crystaldisplay device is completed by attaching an electric circuit that makesa display operation of the assembled liquid crystal panel (liquidcrystal cell) perform and respective components such as a backlight. Inthis case, in the pattern forming step, exposure of a plate is performedwith high throughput, by using the various types of exposure apparatusdescribed above (including exposure apparatus 10 of the embodimentabove), and as a consequence, the productivity of the liquid crystaldisplay devices can be improved.

While the above-described embodiment of the present invention is thepresently preferred embodiment thereof, those skilled in the art oflithography systems will readily recognize that numerous additions,modifications, and substitutions may be made to the above-describedembodiment without departing from the spirit and scope thereof. It isintended that all such modifications, additions, and substitutions fallwithin the scope of the present invention, which is best defined by theclaims appended below

1. A movable body apparatus, comprising: a movable body that can move; asupport device that supports an empty weight of the movable body, andcan move; and a drive device that drives the movable body and alsodrives the support device according to movement of the movable body. 2.The movable body apparatus according to claim 1, wherein the drivedevice drives the support device so that the support device maintainssupport of the movable body.
 3. The movable body apparatus according toclaim 1, wherein the drive device includes a first drive section thatdrives the movable body, and the first drive section is moved togetherwith the support device.
 4. The movable body apparatus according toclaim 3, wherein the support device is placed separately from the firstdrive section in terms of vibration.
 5. The movable body apparatusaccording to claim 3, wherein the support device and the first drivesection are respectively placed on different members.
 6. The movablebody apparatus according to claim 3, wherein the drive device furtherincludes a second drive section that moves the first drive section, andmoves the support device by movement of the first drive section.
 7. Themovable body apparatus according to claim 3, wherein the first drivesection moves the movable body in a noncontact manner and is connectedto the support device.
 8. The movable body apparatus according to claim3, wherein the first drive section is connected to the support device byusing one of a mechanical method, a method using a static pressure of agas, a magnetic method and an electromagnetic method.
 9. The movablebody apparatus according to claim 1, wherein the drive device includes afirst drive section that relatively moves the movable body and thesupport device and a second drive section that moves the support device,and the support device is placed separately from the first and seconddrive sections in terms of vibration.
 10. The movable body apparatusaccording to claim 9, wherein the first drive section is connected tothe support device and the second drive section moves the support devicevia the first drive section.
 11. The movable body apparatus according toclaim 1, wherein the drive device includes a first drive section thatrelatively moves the movable body and the support device and a seconddrive section that moves the support device, and the movable body isplaced separately from the first and second drive sections in terms ofvibration.
 12. The movable body apparatus according to claim 11, whereinthe first drive section is connected to the support device and thesecond drive section moves the support device via the first drivesection.
 13. The movable body apparatus according to claim 1, whereinthe drive device moves the movable body in two-dimensional directions.14. The movable body apparatus according to claim 1, wherein the movablebody has at least three degrees of freedom relative to the supportdevice.
 15. The movable body apparatus according to claim 14, whereinthe movable body has at least one of a spherical bearing and a pluralityof planar bearings.
 16. The movable body apparatus according to claim 1,further comprising: a measurement device that is arranged between themovable body and the support device and measures a position of themovable body relative to the support device.
 17. The movable bodyapparatus according to claim 1, further comprising: a coupling devicethat mechanically couples the movable body and the drive device duringacceleration of the movable body and makes the movable body and thedrive device be in a noncontact state during constant speed movement ofthe movable body.
 18. A pattern forming apparatus that forms a patternon an object, the apparatus comprising: the movable body apparatusaccording to claim 1, in which the object is held on the movable body;and a patterning device that forms the pattern on the object.
 19. Thepattern forming apparatus according to claim 18, wherein the patterningdevice forms the pattern by irradiating the object with an energy beam.20. A pattern forming method, comprising: forming a pattern on an objectusing the pattern forming apparatus according to claim
 18. 21. A devicemanufacturing method using the pattern forming method according to claim20.
 22. A movable body apparatus, comprising: a movable body that canmove; a support device that supports an empty weight of the movablebody, and can move; and a drive device that drives the movable body bymovement of the support device and relative movement of the movable bodyand the support device.
 23. The movable body apparatus according toclaim 22, wherein the drive device includes a first drive section thatrelatively moves the movable body and the support device, and the firstdrive section is moved together with the movable body.
 24. The movablebody apparatus according to claim 23, wherein the support device isplaced separately from the first drive section in terms of vibration.25. The movable body apparatus according to claim 23, wherein thesupport device and the first drive section are respectively placed ondifferent members.
 26. The movable body apparatus according to claim 23,wherein the drive device further includes a second drive section thatmoves the first drive section, and moves the support device by movementof the first drive section.
 27. The movable body apparatus according toclaim 23, wherein the first drive section moves the movable body in anoncontact manner and is connected to the support device.
 28. Themovable body apparatus according to claim 27, wherein the first drivesection is connected to the support device by using one of a mechanicalmethod, a method using a static pressure of a gas, a magnetic method andan electromagnetic method.
 29. The movable body apparatus according toclaim 22, wherein the drive device includes a first drive section thatrelatively moves the movable body and the support device and a seconddrive section that moves the support device, and the support device isplaced separately from the first and second drive sections in terms ofvibration.
 30. The movable body apparatus according to claim 29, whereinthe first drive section is connected to the support device and thesecond drive section moves the support device via the first drivesection.
 31. The movable body apparatus according claim 22, wherein thedrive device includes a first drive section that relatively moves themovable body and the support device and a second drive section thatmoves the support device, and the movable body is placed separately fromthe first and second drive sections in terms of vibration.
 32. Themovable body apparatus according to claim 31, wherein the first drivesection is connected to the support device and the second drive sectionmoves the support device via the first drive section.
 33. The movablebody apparatus according to claim 22, wherein the drive device moves thesupport device in two-dimensional directions.
 34. The movable bodyapparatus according to claim 22, wherein the movable body has at leastthree degrees of freedom relative to the support device.
 35. The movablebody apparatus according to claim 34, wherein the movable body has atleast one of a spherical bearing and a plurality of planar bearings. 36.The movable body apparatus according to claim 22, further comprising: ameasurement device that is arranged between the movable body and thesupport device and measures a position of the movable body relative tothe support device.
 37. The movable body apparatus according to claim22, further comprising: a coupling device that mechanically couples themovable body and the drive device during acceleration of the movablebody and makes the movable body and the drive device be in a noncontactstate during constant speed movement of the movable body.
 38. A patternforming apparatus that forms a pattern on an object, the apparatuscomprising: the movable body apparatus according to claim 22, in whichthe object is held on the movable body; and a patterning device thatforms the pattern on the object.
 39. The pattern forming apparatusaccording to claim 38, wherein the patterning device forms the patternby irradiating the object with an energy beam.
 40. A pattern formingmethod, comprising: forming a pattern on an object using the patternforming apparatus according to claim
 38. 41. A device manufacturingmethod using the pattern forming method according to claim
 40. 42. Amovable body apparatus, comprising: a base having a guiding surface; amovable body that can move relative to the base; and a support devicethat supports an empty weight of the movable body and can move on theguiding surface according to movement of the movable body, wherein themovable body is supported by the support device so that the movable bodycan overhang the guiding surface.
 43. The movable body apparatusaccording to claim 42, wherein an area where the movable body can moveis larger than the guiding surface.
 44. The movable body apparatusaccording to claim 42, wherein a projection area of the support deviceprojected on the guiding surface is smaller than a projection area ofthe movable body projected on the guiding surface, in a supportdirection in which the support device supports the movable body.
 45. Themovable body apparatus according to claim 42, wherein a fluid bearing isformed between the support device and the movable body and between thesupport device and the base.
 46. The movable body apparatus according toclaim 42, wherein the support device has a drive device that drives themovable body in the support direction.
 47. The movable body apparatusaccording to claim 42, wherein the movable body has at least threedegrees of freedom relative to the support device.
 48. The movable bodyapparatus according to claim 42, further comprising: a measurementdevice that is arranged between the movable body and the support deviceand measures a position of the movable body relative to the supportdevice.
 49. A pattern forming apparatus that forms a pattern on anobject, the apparatus comprising: the movable body apparatus accordingto claim 42, in which the object is held on the movable body; and apatterning device that forms the pattern on the object.
 50. The patternforming apparatus according to claim 49, wherein the patterning deviceforms the pattern by irradiating the object with an energy beam.
 51. Apattern forming method, comprising: forming a pattern on an object usingthe pattern forming apparatus according to claim
 49. 52. A devicemanufacturing method using the pattern forming method according to claim51.
 53. A manufacturing method of a movable body apparatus, comprising:providing a base having a guiding surface; providing a movable body thatcan move relative to the base; and providing a support device thatsupports an empty weight of the movable body, can move on the guidingsurface according to movement of the movable body, and supports themovable body so that the movable body can overhang the guiding surface.54. A movable body drive method, comprising: supporting an empty weightof a movable body by a support device that can move; and driving themovable body and also driving the support device according to movementof the movable body.
 55. The movable body drive method according toclaim 54, wherein in the driving, the support device is driven so as tomaintain support of the movable body.
 56. The movable body drive methodaccording to claim 54, wherein in the driving, a first drive sectionthat drives the movable body is moved together with the support device.57. The movable body drive method according to claim 56, wherein thedriving is performed in a state where vibration transmission between thesupport device and the first drive section is prevented.
 58. The movablebody drive method according to claim 56, wherein the support device andthe first drive section are respectively placed on different members.59. The movable body drive method according to claim 56, wherein thedriving is performed by providing a second drive section that moves thefirst drive section and moving the support device by movement of thefirst drive section.
 60. The movable body drive method according toclaim 56, wherein the first drive section is connected to the supportdevice, and in the driving, the movable body moves in a noncontact statewith the first drive section.
 61. The movable body drive methodaccording to claim 56, wherein the first drive section is connected tothe support device by using one of a mechanical method, a method using astatic pressure of a gas, a magnetic method and an electromagneticmethod.
 62. The movable body drive method according to claim 54, whereina first drive section that relatively moves the movable body and thesupport device and a second drive section that moves the support deviceare provided, and vibration transmission between the support device andthe first and second drive sections is prevented.
 63. The movable bodydrive method according to claim 62, wherein in the driving, the firstdrive section and the support device are connected and the supportdevice is moved by the second drive section via the first drive section.64. The movable body drive method according to claim 54, wherein a firstdrive section that relatively moves the movable body and the supportdevice and a second drive section that moves the support device areprovided, and vibration transmission between the movable body and thefirst and second drive sections is prevented.
 65. The movable body drivemethod according to claim 64, wherein in the driving, the first drivesection and the support device are connected and the support device ismoved by the second drive section via the first drive section.
 66. Themovable body drive method according to claim 54, wherein the movablebody is moved in at least three degrees of freedom relative to thesupport device.
 67. The movable body drive method according to claim 54,further comprising: obtaining information regarding a position of themovable body relative to the support device, by a measurement devicearranged between the movable body and the support device.
 68. Themovable body drive method according to claim 54, wherein in the driving,the movable body and the drive device are mechanically coupled duringacceleration of the movable body and the movable body and the drivedevice are in a noncontact state during constant speed movement of themovable body.
 69. A pattern forming method of forming a pattern on anobject, the method comprising: driving a movable body that holds theobject, by using the movable body drive method according to claim 54.70. A device manufacturing method using the pattern forming methodaccording to claim
 69. 71. A movable body drive method, comprising:supporting an empty weight of a movable body by a support device thatcan move; and driving the movable body by movement of the support deviceand relative movement of the movable body and the support device. 72.The movable body drive method according to claim 71, wherein in thedriving, a first drive section that moves the movable body is movedtogether with the support device.
 73. The movable body drive methodaccording to claim 72, wherein the driving is performed in a state wherevibration transmission between the support device and the first drivesection is prevented.
 74. The movable body drive method according toclaim 72, wherein the support device and the first drive section arerespectively placed on different members.
 75. The movable body drivemethod according to claim 72, wherein the driving is performed byproviding a second drive section that moves the first drive section andmoving the support device by movement of the first drive section. 76.The movable body drive method according to claim 72, wherein the firstdrive section is connected to the support device, and in the driving,the movable body moves in a noncontact state with the first drivesection.
 77. The movable body drive method according to claim 76,wherein the first drive section is connected to the support device byusing one of a mechanical method, a method using a static pressure of agas, a magnetic method and an electromagnetic method.
 78. The movablebody drive method according to claim 71, wherein a first drive sectionthat relatively moves the movable body and the support device and asecond drive section that moves the support device are provided, andvibration transmission between the support device the first and seconddrive sections is prevented.
 79. The movable body drive method accordingto claim 78, wherein in the driving, the first drive section and thesupport device are connected and the support device is moved by thesecond drive section via the first drive section.
 80. The movable bodydrive method according claim 71, wherein a first drive section thatrelatively moves the movable body and the support device and a seconddrive section that moves the support device are provided, and vibrationtransmission between the movable body and the first and second drivesections is prevented.
 81. The movable body drive method according toclaim 80, wherein in the driving, the first drive section and thesupport device are connected and the support device is moved by thesecond drive section via the first drive section.
 82. The movable bodydrive method according to claim 71, wherein the movable body is moved inat least three degrees of freedom relative to the support device. 83.The movable body drive method according to claim 71, further comprising:obtaining information regarding a position of the movable body relativeto the support device, by a measurement device arranged between themovable body and the support device.
 84. The movable body drive methodaccording to claim 71, wherein in the driving, the movable body and thedrive device are mechanically coupled during acceleration of the movablebody and the movable body and the drive device are in a noncontact stateduring constant speed movement of the movable body.
 85. A patternforming method of forming a pattern on an object, the method comprising:driving a movable body that holds the object, by using the movable bodydrive method according to claim
 71. 86. A device manufacturing methodusing the pattern forming method according to claim
 85. 87. A movablebody drive method, comprising: supporting an empty weight of a movablebody by a support device that can move; and moving the support device ona guiding surface of a base, wherein the movable body is supported bythe support device so that the movable body can overhang the guidingsurface.
 88. The movable body drive method according to claim 87,wherein the movable body is moved in a movement area larger than theguiding surface.
 89. The movable body drive method according to claim87, wherein a projection area of the support device projected on theguiding surface is smaller than a projection area of the movable bodyprojected on the guiding surface, in a support direction in which thesupport device supports the movable body.
 90. The movable body drivemethod according to claim 87, further comprising: forming a fluidbearing between the support device and the movable body and between thesupport device and the base.
 91. The movable body drive method accordingto claim 87, further comprising: driving the movable body in the supportdirection by the support device.
 92. The movable body drive methodaccording to claim 87, wherein the movable body is moved in at leastthree degrees of freedom relative to the support device.
 93. The movablebody drive method according to claim 87, further comprising: obtaininginformation regarding a position of the movable body relative to thesupport device, by a measurement device arranged between the movablebody and the support device.
 94. A pattern forming method of forming apattern on an object, the method comprising: driving a movable body thatholds the object, by using the movable body drive method according toclaim
 87. 95. A device manufacturing method using the pattern formingmethod according to claim 94.